Architectural effects on acid reaction-diffusion kinetics in molecular glass photoresists

Chemistry of Materials

Volumn 22, Issue 10, 2010, Pages 3093-3098

  Sha, Jing ^a   Lee, Jin Kyun ^a   Kang, Shuhui ^b   Prabhu, Vivek M ^b   Soles, Christopher L ^b   Bonnesen, Peter V ^c   Ober, Christopher K ^a  

^a School of Operations Research and Industrial Engineering   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID DIFFUSION; ACID REACTIONS; CHEMICAL SIMILARITY; CHEMICALLY AMPLIFIED PHOTORESIST; DIFFUSION LENGTH; DIFFUSIVITIES; FEATURE RESOLUTION; HIGH RESOLUTION; IN-SITU; LATENT IMAGE FORMATION; LINE EDGE ROUGHNESS; MOLAR DENSITY; MOLECULAR ARCHITECTURE; MOLECULAR DESIGN; MOLECULAR GLASS; PEB TEMPERATURE; PHOTOACID GENERATORS; POLY(4-HYDROXYSTYRENE); POSITIVE-TONE; RESIST SYSTEMS; RING ARCHITECTURE;

DIFFUSION IN LIQUIDS; GLASS; INFRARED SPECTROSCOPY; PHOTORESISTS; REACTION RATES; SPECTROSCOPIC ANALYSIS;

ACIDS;

EID: 77952466834     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm9038939     Document Type: Article

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