Dry etch fabrication of porous silicon using xenon difluoride

Micro and Nano Letters

Volumn 5, Issue 2, 2010, Pages 63-69

  Hajj Hassan, M ^a   Cheung, M ^a   Chodavarapu, V ^a  

^a MCGILL UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT TRENDS; DIFFERENT PORE SIZES; DRY ETCHING TECHNIQUES; DRY-ETCH; ETCHING TECHNIQUE; FABRICATION PROCESS; INTEGRATED MICROSYSTEMS; MASKING LAYERS; MONOLITHIC INTEGRATION; OPTICAL REFLECTANCE; PHOTORESIST LAYERS; POTENTIAL APPLICATIONS; SILICON DEVICES; SILICON MATERIALS; SILICON SAMPLES; WIDE SPECTRUM; XENON DIFLUORIDE;

FABRICATION; MICROELECTRONICS; MONOLITHIC INTEGRATED CIRCUITS; PHOTORESISTS; PLASMA ETCHING; PORE SIZE; XENON;

POROUS SILICON;

SILICON; UNCLASSIFIED DRUG; XENON; XENON DIFLUORIDE;

ARTICLE; DEVICE; ELECTRON MICROSCOPY; MATERIALS TESTING; POROSITY; SYNTHESIS;

EID: 77951541967     PISSN: None     EISSN: 17500443     Source Type: Journal    
DOI: 10.1049/mnl.2009.0107     Document Type: Article

References (33)

1. Canham, L.T.: ' Properties of porous silicon ', (Inspec, IEE, London, 1997)
2. Feng, Z.C., and Tsu, R.: ' Porous silicon ', (World Scientific Pub Co Inc, 1994)
3. Canham, L.T.: ' Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers ', Appl. Phys. Lett., 1990, 57, (10), p. 1046-1048 10.1063/1.103561 0003-6951
4. Cullis, A.G., Canham, L.T., and Calcott, P.D.J.: ' The structural and luminescence properties of porous silicon ', J. Appl. Phys., 1997, 82, (3), p. 909-965 10.1063/1.366536 0021-8979
5. Foll, H., Christophersen, M., Carstensen, J., and Hasse, G.: ' Formation and application of porous silicon ', Mater. Sci. Eng. R-Rep., 2002, 39, (4), p. 93-141
6. Martin-Palma, R.J., Herrero, P., and Guerro-Lemus, R.: et al. ' Cross-section TEM and optical characterization of porous silicon multilayer stacks ', J. Mater. Sci. Lett., 1998, 17, (10), p. 845-847
7. Berger, M.G., Dieker, C., and Thonissen, M.: et al. ' Porosity superlattices - a new class of Si heterostructures ', J. Phys. D-Appl. Phys., 1994, 27, (6), p. 1333-1336
8. Saha, H., and Pramanik, C.: ' Porous silicon-based sensors: prospects and challenges ', Mater. Manuf. Process., 2006, 21, (3), p. 239-246 10.1080/10426910500464461 1042-6914
9. Foucaran, A., Pascalk-Delannoy, F., and Giani, A.: et al. ' Porous silicon layers used for gas sensor applications ', Thin Solid Films, 1997, 297, (1-2), p. 317-320 0040-6090
10. Sailor, M.J., and Link, J.R.: ' "Smart dust": nanostructured devices in a grain of sand ', Chem. Commun., 2005, 11, p. 1375-1383
11. Stewart, M.P., and Buriak, J.M.: ' Chemical and biological applications of porous silicon technology ', Adv. Mater., 2000, 12, (12), p. 859-869 0935-9648
12. Williams, R.A., and Blanch, H.W.: ' Covalent immobilization of protein monolayers for biosensor applications ', Biosens. Bioelectron., 1994, 9, (2), p. 159-167 0956-5663
13. Janshoff, A., Dancil, K-P.S., and Steinem, C.: et al. ' Macroporous p-type silicon Fabry-Perot layers. Fabrication, characterization, and applications in biosensing ', J. Am. Chem. Soc., 1998, 120, (46), p. 12108-12116 0002-7863
14. Chan, S., Fauchet, P.M., and Li, Y.: et al. ' Porous silicon microcavities for biosensing applications ', Phys. Stat. Solidi A-Appl. Res., 2000, 182, (1), p. 541-546
15. Coffer, J.L., Whitehead, M.A., and Nagesha, D.K.: et al. ' Porous silicon-based scaffolds for tissue engineering and other biomedical applications ', Phys. Stat. Sol. A-Appl. Mater. Sci., 2005, 202, (8), p. 1451-1455
16. Anglin, E.J., Cheng, L., and Freeman, W.R.: et al. ' Porous silicon in drug delivery devices and materials ', Adv. Drug Deliv. Rev., 2008, 60, (11), p. 1266-1277
17. Pavesi, L., and Dubos, P.: ' Random porous silicon multilayers: application to distributed Bragg reflectors and interferential Fabry-Perot filters ', Semicond. Sci. Technol., 1997, 12, (5), p. 570-575 0268-1242
18. Strehlke, S., Bastide, S., and Levy-Clement, C.: ' Optimization of porous silicon reflectance for silicon photovoltaic cells ', Sol. Energ. Mat. Sol. C, 1999, 58, (4), p. 399-409
19. Lammel, G., Schweizer, S., and Schiesser, S.: et al. ' Tunable optical filter of porous silicon as key component for a MEMS spectrometer ', J. Microelectromech. Syst., 2002, 11, (6), p. 815-828 10.1109/JMEMS.2002.803278 1057-7157
20. Berger, M.G., Thönissen, M., and Arens-Fischer, R.: et al. ' Investigation and design of optical-properties of porosity superlattices ', Thin Solid Films, 1995, 255, (1-2), p. 313-316 0040-6090
21. Striemer, C.C., Gaborski, T.R., and McGrath, J.L.: et al. ' Charge- and size-based separation of macromolecules using ultrathin silicon membranes ', Nature, 2007, 445, (7129), p. 749-753 0028-0836
22. de Vasconcelos, E.A., da Silva, E.F., Santos, B.D., de Azevedo, W.M., and Freire, J.A.K.: ' A new method for luminescent porous silicon formation: reaction-induced vapor phase stain etch ', Phys. Stat. Sol. A - Appl. Mat., 2005, 202, p. 1539-1542
23. Smith, R.L., and Collins, S.D.: ' Porous silicon formation mechanisms ', J. Appl. Phys., 1992, 71, (8), p. R1-R22 0021-8979
24. Escorcia-Garcia, J., Sarracino Martínez, O., Gracia- Jiménez, J.M., and Agarwal, V.: ' Porous silicon photonic devices using pulsed anodic etching of lightly doped silicon ', J. Phys. D: Appl., 2009, 42, article no. 145101 (7pp)
25. Nakagawa, T., Koyama, H., and Koshida, N.: ' Control of structure and optical anisotropy in porous Si by magnetic-field assisted anodization ', Appl. Phys. Lett., 1996, 69, (21), p. 3206-3208 0003-6951
26. Arana, L.R., De Mas, N., and Schmidt, R.: et al. ' Isotropic etching of silicon in fluorine gas for MEMS micromachining ', J. Micromech. Microeng., 2007, 17, (2), p. 384-392 10.1088/0960-1317/17/2/026 0960-1317
27. Aliev, V.S., and Kruchinin, V.N.: ' Development of Si (100) surface roughness at the initial stage of etching in F-2 and XeF2 gases: ellipsometric study ', Surf. Sci., 1999, 442, (2), p. 206-214 0039-6028
28. 2 vapor ', Appl. Phys. Lett., 1979, 34, (1), p. 70-73 0003-6951
29. Patel, S.R., Schaadt, G.P., Macdonald, D.B., Shi, H., Huibers, A.G., and Heureux, P.: ' Method for vapor phase etching of silicon ', (Reflectivity, Inc., 2002)
30. Engstrom, J.R., Nelson, M.M., and Engel, T.: ' The adsorption and reaction of fluorine on the Si(100) surface ', Surf. Sci., 1989, 215, (3), p. 437-500 0039-6028
31. 2 etching: reaction layer dynamics and surface roughening ', J. Vac. Sci. Technol. A, Vac. Surf. Films, 1996, 14, (5), p. 2780-2789 0734-2101
32. Rossi, B.: ' Optics ', (Addison-Wesley, Reading, MA, 1957)
33. Riley, D.W., and Gerhardt, R.A.: ' Effect of porosity on the optical properties of anodized porous silicon thin films ', Annual Report Conf. on Electrical Insulation and Dielectric Phenomena, 1998, 1, p. 248-251