Precise surface measurements at the nanoscale

Measurement Science and Technology

Volumn 21, Issue 5, 2010, Pages

  Fedina, L I ^a   Sheglov, D V ^a,b   Kosolobov, S S ^a   Gutakovskii, A K ^a   Latyshev, A V ^a,b  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b NOVOSIBIRSK STATE UNIVERSITY   (Russian Federation)

Author keywords

Atomic force microscopy; Monatomic step; Nanoscale measurements; Self assembly effects; Surface

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOTECHNOLOGY; OXIDE FILMS; SELF ASSEMBLY; SILICON; SURFACE MEASUREMENT; SURFACES;

DIGITAL MICROGRAPHS; HEIGHT MEASUREMENT; HIGH-TEMPERATURE ANNEALS; INTERPLANAR SPACINGS; MONATOMIC STEP; NANO-SCALE MEASUREMENTS; NATIVE OXIDE LAYER; ULTRA-HIGH VACUUM CHAMBER;

UNCERTAINTY ANALYSIS;

EID: 77950931433     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/21/5/054004     Document Type: Article

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