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Volumn 132, Issue 12, 2010, Pages

Validation of density-functional versus density-functional+U approaches for oxide ultrathin films

Author keywords

[No Author keywords available]

Indexed keywords

FORECASTING; II-VI SEMICONDUCTORS; INTERFACE STATES; NICKEL OXIDE; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTAL SURFACES; SINGLE CRYSTALS; TITANIUM DIOXIDE; TRANSITION METAL OXIDES; TRANSITION METALS; ULTRATHIN FILMS; ZINC OXIDE;

EID: 77950453775     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3366689     Document Type: Article
Times cited : (46)

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    • Full geometry optimization within the DF+U approach is not possible in the PWSCF package.
    • Full geometry optimization within the DF+U approach is not possible in the PWSCF package.


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