Fabrication and field emission properties of multi-walled carbon nanotube/silicon nanowire array

Journal of Physics and Chemistry of Solids

Volumn 71, Issue 4, 2010, Pages 708-711

  Qinke, Shu ^a   Wei, Jinquan ^a   Wang, Kunlin ^a   Gui, Xuchun ^a   Ma, Chaoran ^a   Zhu, Hongwei ^a   Jia, Yi ^a   Li, Xinming ^a   Guo, Ning ^a   Wu, Dehai ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

A. Nanostructures; B. Vapor deposition; C. Electron microscopy; D. Electrical properties

Indexed keywords

A. NANOSTRUCTURES; AVERAGE DIAMETER; B. VAPOR DEPOSITION; CHEMICAL VAPOR DEPOSITION METHODS; D. ELECTRICAL PROPERTIES; ELECTRICAL PROPERTY; FIELD EMISSION PROPERTY; METAL-ASSISTED CHEMICAL ETCHING; MULTI-WALLED; NANOWIRE ARRAYS; POTENTIAL APPLICATIONS; SILICON NANOWIRES; TURN-ON ELECTRIC FIELD; TURN-ON FIELD;

CARBON NANOTUBES; ELECTRIC FIELDS; ELECTRIC WIRE; FABRICATION; FIELD EMISSION; MULTIWALLED CARBON NANOTUBES (MWCN); NANOWIRES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

ELECTRIC PROPERTIES;

EID: 77949571250     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2009.12.072     Document Type: Article

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