Properties of Ce-doped ITO films deposited on polymer substrate by DC magnetron sputtering

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 3081-3084

  Kang, Y M ^a   Kwon, S H ^a   Choi, J H ^b   Cho, Y J ^b   Song, P K ^a  

^a Pusan National University   (South Korea)

^b Samsung Corning Co Ltd   (South Korea)

Author keywords

Amorphous; Bending test; In Sn Ce O; Indium tin oxide; Magnetron sputtering

Indexed keywords

CE CONTENTS; CRYSTALLINITIES; CRYSTALLIZATION TEMPERATURE; DC MAGNETRON SPUTTERING; DYNAMIC STRESS; ELECTRICAL PROPERTY; FLEXIBLE POLYIMIDE SUBSTRATE; HIGH TEMPERATURE; IN-SN-CE-O; INDIUM TIN OXIDE; ITO FILMS; POLYCRYSTALLINE FILM; POLYMER SUBSTRATE; ROOM TEMPERATURE;

AMORPHOUS FILMS; CERIUM; CERIUM COMPOUNDS; ELECTRIC PROPERTIES; INDIUM; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; OXIDE FILMS; PHOTOLITHOGRAPHY; POLYIMIDES; POLYMER FILMS; SUBSTRATES; SURFACE ROUGHNESS; TIN; TITANIUM COMPOUNDS;

ITO GLASS;

EID: 77649160689     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.08.016     Document Type: Article

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