Effects of Ca doping on nodule formation of on ITO target during DC magnetron sputtering

Journal of the Korean Physical Society

Volumn 54, Issue 3, 2009, Pages 1315-1319

  Cho, Sang Hyun ^a   Kang, Yong Min ^a   Lee, Jung Rak ^a   Ryu, Bong Ki ^a   Song, Pung Keun ^a   Lee, Jin Ho ^b   Choi, Jun Ho ^b  

^a Pusan National University   (South Korea)

^b Samsung Corning Co Ltd   (South Korea)

Author keywords

High efficiency; Indium tin oxide; Magnetron sputtering; Micro arcing; Micro nodule

Indexed keywords

EID: 64549135495     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.54.1315     Document Type: Article

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