Properties of ITO films deposited by RF superimposed DC magnetron sputtering

Current Applied Physics

Volumn 9, Issue 3 SUPPL., 2009, Pages

  Kim, Se Il ^a   Cho, Sang Hyun ^a   Choi, Sung Ryong ^a,b   Yoon, Han Ho ^b   Song, Pung Keun ^a  

^a Pusan National University   (South Korea)

^b Samsung Corning Co Ltd   (South Korea)

Author keywords

Electrical and structural properties; Indium tin oxide; Magnetron sputtering; Transparent conductive oxide

Indexed keywords

CERAMIC TARGET; CRYSTALLIZATION TEMPERATURE; DC MAGNETRON SPUTTERING; DC MAGNETRON SPUTTERING SYSTEMS; DISCHARGE VOLTAGES; ELECTRICAL AND STRUCTURAL PROPERTIES; INDIUM TIN OXIDE; ITO FILMS; LOW RESISTIVITY; POWER RATIO; ROOM TEMPERATURE; SPUTTERING POWER; TOTAL POWER; TRANSPARENT CONDUCTIVE OXIDE;

INDIUM; MAGNETRON SPUTTERING; PHOTOLITHOGRAPHY; TIN;

MAGNETRONS;

EID: 67349137176     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.01.031     Document Type: Article

References (18)

1. Jang H.D., Seong C.M., Chang H.K., and Kim H.C. Curr. Appl. Phys. 6 (2006) 1044
2. Singjai P., Wongwigkarn K., Laosiritaworn Y., Yimnirun R., and Maensiri S. Curr. Appl. Phys. 7 (2007) 662
3. Lee S.Y., and Park B.O. Thin Solid Films 484 (2005) 184
4. Huang Y., Yu K., and Zhu Z. Curr. Appl. Phys. 7 (2007) 702
5. Kelly P.J., and Arnell R.D. Vacuum 56 (2000) 159
6. Ellmer K. J. Phys. D: Appl. Phys. 33 (2000) R17
7. Stowell M., Muller J., Ruske M., Lutz M., and Linz T. Thin Solid Films 515 (2007) 7654
8. Song P.K., Shigesato Y., Kamei M., and Yasui I. Jpn. J. Appl. Phys. 38 (1999) 2921
9. Bender M., Trube J., and Stollenwerk J. Thin Solid Films 354 (1999) 100
10. Kim D.G., Lee S.H., Park M.R., Jeong Y.J., Lee G.H., and Song P.K. Solid State Phenom. 124 (2007) 367
11. Kurdesau F., Khripunov G., Cunha A.F., Kaelin M., and Tiwari A.N. J. Non-Cryst. Solids 352 (2006) 1466
12. Nishimura E., Sasabayashi T., Ito N., Sato Y., Utsumi K., Yano K., Kaijo A., Inoue K., and Shigesato Y. Jpn. J. Appl. Phys. 46 (2007) 7806
13. Song P.K., Shigesato Y., Yasui I., O-Yang C.W., and Paine D.C. Jpn. J. Appl. Phys. 37 (1998) 1870
14. Futagami T., Shigesato Y., and Yasui I. Jpn. J. Appl. Phys. 37 (1998) 6210
15. Adurodija F.O., Izumi H., Ishihara T., Yoshioka H., Motoyama M., and Murai K. Vacuum 67 (2002) 209
16. Yi C.H., Shigesato Y., Yasui I., and Takaki S. Jpn. J. Appl. Phys. 34 (1995) 244
17. Vink T.J., Walrave W., Daams J.L.C., Baarslag P.C., and Meerakker J.E.A.M. Thin Solid Films 266 (1995) 145
18. Park S.K., Han J.I., Kim W.K., and Kwak M.G. Thin Solid Films 397 (2001) 49