Optical on-line monitoring for the long-term stabilization of a reactive mid-frequency sputtering process of Al-doped zinc oxide films

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 3115-3118

  Sittinger, V ^a   Ruske, F ^b   Pflug, A ^a   Dewald, W ^a   Szyszka, B ^a   Dittmar, G ^c  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

^c SENTECH INSTRUMENTS GMBH   (Germany)

Author keywords

Aluminum doped zinc oxide films; Process control; Reactive sputter deposition; Thin film solar cells

Indexed keywords

AL-DOPED ZINC OXIDE FILMS; ALUMINUM DOPED ZINC OXIDE FILMS; ALUMINUM-DOPED ZINC OXIDE; BAND GAPS; CLOSED-LOOP FEEDBACK CONTROL; FREE CARRIER ABSORPTION; HALL MEASUREMENTS; LONG TERM DRIFT; LONG-TERM OPERATION; MID-FREQUENCY; ON-LINE CONTROLS; ONLINE MONITORING; OPERATION POINT; OPTIMUM PROCESS CONDITIONS; OXYGEN PARTIAL PRESSURE; PLASMA FREQUENCIES; PRODUCTION PROCESS; REACTIVE SPUTTER DEPOSITION; SPUTTERING PROCESS; THIN FILM SOLAR CELLS; VISIBLE AND NEAR INFRARED; ZNO;

ABSORPTION; ADAPTIVE CONTROL SYSTEMS; ALUMINUM; ALUMINUM COATINGS; CARRIER CONCENTRATION; CLOSED LOOP CONTROL SYSTEMS; DEPOSITION; FEEDBACK CONTROL; OXIDE FILMS; OXYGEN; PLASMA DEPOSITION; PLASMA WAVES; SOLAR CELLS; SOLAR CONTROL FILMS; THIN FILM DEVICES; THIN FILMS; VOLTAGE MEASUREMENT; ZINC; ZINC OXIDE;

PROCESS CONTROL;

EID: 77649121568     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.09.167     Document Type: Article

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