Nano-fabrication of condenser and micro-zone plates for compact X-ray microscopy

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 639-643

  Holmberg, A ^a   Rehbein, S ^a,b   Hertz, H M ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Electron beam lithography; X ray optics; Zone plates

Indexed keywords

ABERRATIONS; ASPECT RATIO; DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; IMAGING TECHNIQUES; NANOTECHNOLOGY; NICKEL; REACTIVE ION ETCHING; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS; X RAY MICROSCOPES; X RAY OPTICS;

CHROMATIC ABERRATION; HIGH-RESOLUTION IMAGING; PATTERN QUALITY; ZONE PLATES;

PLATES (STRUCTURAL COMPONENTS);

EID: 2542479378     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00174-1     Document Type: Conference Paper

References (8)

1. See, e.g. Rymell L., Berglund M., Hertz H.M. Appl. Phys. Lett. 66:1995;2625.
2. Berglund M., Rymell L., Peuker M., Wilhein T., Hertz H.M. J. Microsc. 197:2000;268 Johansson G., Holmberg A., Hertz H.M., Berglund M. Rev. Sci. Instrum. 73:2002;1193.
3. Berglund M., Rymell L., Peuker M., Wilhein T., Hertz H.M. J. Microsc. 197:2000;268 Johansson G., Holmberg A., Hertz H.M., Berglund M. Rev. Sci. Instrum. 73:2002;1193.
4. See, e.g. Attwood D. Soft X-rays and Extreme Ultraviolet Radiation. 2000;Cambridge University Press, Cambridge.
5. Wilhein T., Hambach D., Niemann B., Berglund M., Rymell L., Hertz H.M. Appl. Phys. Lett. 71:1997;190.
6. Peuker M. Appl. Phys. Lett. 78:2001;2208.
7. Anderson E.H., Olynick D.L., Harteneck B., Veklerov E., Denbeaux G., Chao W., Lucero A., Johnson L., Attwood D. J. Vac. Sci. Technol. B. 18(6):2000.
8. S. Rehbein, A. Holmberg, G.A. Johansson, P.A.C. Jansson, H.M. Hertz, J. Vac. Sci. Technol. B (2003), accepted.