SCOPUS 정보 검색 플랫폼

Philosophical Magazine

Volumn 89, Issue 28-30, 2009, Pages 2435-2448

Structural properties of amorphous silicon prepared from hydrogen-diluted silane

(4) Zeman, M a Van Elzakker, G a Tichelaar, F D b Sutta, P c

a DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

b DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

c UNIVERSITY OF WEST BOHEMIA (Czech Republic)

Author keywords

Hydrogen diluted amorphous silicon; Solar cell; Structural analysis; X ray diffraction

Indexed keywords

A-SI:H; ABSORBER LAYERS; AMORPHOUS SILICON FILM; DILUTION RATIO; GROWTH OF FILMS; HIGH-RESOLUTION TEM; HYDROGEN DILUTION; HYDROGEN DILUTION RATIO; IMAGING METHOD; LIGHT EXPOSURE; LIGHT-INDUCED DEGRADATION; ORDERED DOMAINS; SILICON CRYSTALLITES; SINGLE JUNCTION SOLAR CELLS; TEM; XRD PATTERNS;

AMORPHOUS FILMS; BIODEGRADATION; DIFFRACTION; DILUTION; FILM PREPARATION; HYDROGEN; LIGHT; METALLIC FILMS; MICROCRYSTALLINE SILICON; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; PHOTODEGRADATION; PLASMA DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILANES; SOLAR ABSORBERS; SOLAR CELLS; SOLAR POWER GENERATION; STRUCTURAL ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SILICON;

EID: 76849087127 PISSN: 14786435 EISSN: 14786443 Source Type: Journal
DOI: 10.1080/14786430902960137 Document Type: Article

Times cited : (30)

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