Cone kinetics model for two-phase film silicon deposition

Applied Physics Letters

Volumn 92, Issue 9, 2008, Pages

  Teplin, Charles W ^a   Jiang, C S ^a   Stradins, Paul ^a   Branz, Howard M ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HETEROJUNCTIONS; MORPHOLOGY;

CONE KINETICS MODELS; SILICON HETEROJUNCTIONS; THIN FILM MATERIALS;

THIN FILMS;

EID: 40549106531     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2891087     Document Type: Article

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