Nanoindentation and atomic force microscopy measurements on reactively sputtered TiN coatings

Bulletin of Materials Science

Volumn 27, Issue 1, 2004, Pages 35-41

  Barshilia, Harish C ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

Atomic force microscopy; Mechanical properties; Nanoindentation measurements; Reactive magnetron sputtering; TiN coatings

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; ELASTIC MODULI; FILM PREPARATION; GRAIN SIZE AND SHAPE; HARDNESS; INDENTATION; ION BOMBARDMENT; MAGNETRON SPUTTERING; MORPHOLOGY; PARTIAL PRESSURE; SPUTTER DEPOSITION;

BERKOVICH DIAMOND INDENTER; BIAS VOLTAGE; NANOINDENTATION;

TITANIUM NITRIDE;

EID: 1142281131     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02708482     Document Type: Article

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