Fabrication and characterization of subwavelength nanostructures on freestanding GaN slab

Optics Express

Volumn 18, Issue 3, 2010, Pages 2940-2945

  Wang, Yongjin ^a   Hu, Fangren ^a   Kanamori, Yoshiaki ^a   Sameshima, Hidehisa ^a   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; EXTRACTION; GALLIUM NITRIDE; LIGHT REFLECTION; NANOSPHERES; NONVOLATILE STORAGE; SEMICONDUCTOR QUANTUM WELLS; SILICA;

ACTIVE LAYER; BULK SILICON MICROMACHINING; CONFINED MODES; EMITTED LIGHT; ETCHING MASKS; FAST ATOM BEAMS; FREESTANDING GAN; INGAN/GAN; LIGHT-EXTRACTION EFFICIENCY; MULTIPLE QUANTUM WELLS; NANO-STRUCTURED; REFLECTION LOSS; SELF-ASSEMBLE; SELF-ASSEMBLED SILICA; SILICON SUBSTRATES; SUB-WAVELENGTH; THINNING METHODS;

GALLIUM ALLOYS;

EID: 76149125795     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.002940     Document Type: Article

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