RF-plasma-assisted fast atom beam etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6976-6979

  Ono, Takahito ^a   Orimoto, Norimune ^a   Lee, Seungseoup ^a   Simizu, Toshiki ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Dry etching; Fast beam; Kinetic energy; Low damage; Spectroscopic ellipsometry

Indexed keywords

ANISOTROPY; ANODES; CATHODES; DRY ETCHING; ELLIPSOMETRY; KINETIC ENERGY;

PLASMA-ASSISTED FAST ATOM BEAM ETCHING;

PLASMA ETCHING;

EID: 0034429037     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6976     Document Type: Article

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