Effect of humidity on nanoscale adhesion on self-assembled thiol monolayers studied by dynamic force spectroscopy

Langmuir

Volumn 26, Issue 3, 2010, Pages 1837-1847

  Gojzewski, Hubert ^a,b   Kappl, Michael ^b   Ptak, Arkadiusz ^a   Butt, Hans Jürgen ^b  

^a POZNAN UNIVERSITY OF TECHNOLOGY   (Poland)

^b MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION FORCES; ATOMIC FORCE MICROSCOPES; CAPILLARY FORCE; DYNAMIC FORCE SPECTROSCOPY; HYDROGEN BRIDGES; HYDROXYL GROUPS; LOADING RATE; LOW HUMIDITY; NANOSCALE ADHESION; RELATIVE HUMIDITIES; SAMS; SELF-ASSEMBLED; SILANOL GROUPS; THIOL MONOLAYER; TWO-REGIME; VAN DER WAALS ATTRACTION;

ADHESION; ALGEBRA; ATMOSPHERIC HUMIDITY; ELECTRON ENERGY LEVELS; LOADING; MOISTURE; SELF ASSEMBLED MONOLAYERS; SILICON NITRIDE; VAN DER WAALS FORCES;

LOADS (FORCES);

HYDROXIDE; HYDROXIDE ION; NANOMATERIAL; THIOL DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; HUMIDITY; HYDROPHOBICITY; KINETICS; SPECTROSCOPY; SURFACE PROPERTY;

HUMIDITY; HYDROPHOBICITY; HYDROXIDES; KINETICS; MICROSCOPY, ATOMIC FORCE; NANOSTRUCTURES; SPECTRUM ANALYSIS; SULFHYDRYL COMPOUNDS; SURFACE PROPERTIES;

EID: 75749121891     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la902559n     Document Type: Article

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