Effect of bias treatment in the CVD diamond growth on Ir(001)

Diamond and Related Materials

Volumn 13, Issue 11-12, 2004, Pages 2081-2087

  Kono, S ^a   Takano, T ^a   Goto, T ^a   Ikejima, Y ^a   Shiraishi, M ^a   Abukawa, T ^a   Yamada, T ^b,c   Sawabe, A ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b AOYAMA GAKUIN UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

CVD hetero epitaxial diamond (001); Diamond growth and characterisation; Ir(001) substrate; X ray photoelectron diffraction

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; IRIDIUM; LOW ENERGY ELECTRON DIFFRACTION; NUCLEATION;

BIAS TREATMENT (BT); DIAMOND GROWTH AND CHARACTERIZATION; X-RAY PHOTOELECTRON DIFFRACTION (XPD);

DIAMONDS;

EID: 7544220284     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.07.009     Document Type: Conference Paper

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