Interface between CVD diamond and iridium films

Surface Science

Volumn 467, Issue 1-3, 2000, Pages

  Sawabe, Atsuhito ^a   Fukuda, Hideo ^a   Suzuki, Tosiyuki ^b   Ikuhara, Yuichi ^c   Suzuki, Tetsuya ^d  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b JAPAN FINE CERAMICS CENTER   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; DISLOCATIONS (CRYSTALS); ELECTRON DIFFRACTION; EPITAXIAL GROWTH; IRIDIUM; METALLIC FILMS; MORPHOLOGY; NUCLEATION; SURFACE ROUGHNESS; SYNTHETIC DIAMONDS;

HETEROEPITAXIAL INTERFACES;

INTERFACES (MATERIALS);

EID: 0034324334     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)00793-7     Document Type: Article

References (12)

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12. Otsuka K., Fukuda H., Suzuki K., Sawabe A. Jpn. J. Appl. Phys. 36:1997;L1214.