Convergence and reliability of the Rehr-Albers formalism in multiple-scattering calculations of photoelectron diffraction

Physical Review B - Condensed Matter and Materials Physics

Volumn 58, Issue 19, 1998, Pages 13121-13131

  Chen, Y ^a   Garcia de Abajo F ^a   Chasse A ^a   Ynzunza, R ^a   Kaduwela, A ^a   Van Hove, M ^a   Fadley, C ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001161101     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.58.13121     Document Type: Article

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