Effect of processing parameters on the microstructure and mechanical properties of TiN film on stainless steel by HCD ion plating

Thin Solid Films

Volumn 355, Issue , 1999, Pages 440-445

  Huang, J H ^a   Tsai, Y P ^a   Yu, G P ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; FILM PREPARATION; GRAIN SIZE AND SHAPE; MICROHARDNESS; PROTECTIVE COATINGS; STAINLESS STEEL; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HOLLOW CATHODE DISCHARGE ION PLATING (HCD-IP); INTERLAYERS;

THIN FILMS;

EID: 0033364925     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00670-7     Document Type: Article

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