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Applied Surface Science

Volumn 253, Issue 9, 2007, Pages 4415-4419

The effect of bias voltage and working pressure on S/Mo ratio at MoS 2 -Ti composite films

(3) Bulbul F a Efeoǧlu, I a Arslan, E a

a ATATÜRK UNIVERSITY (Turkey)

Author keywords

Bias; MoS 2 Ti; S Mo; Sputtering; Working pressure

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; SILICON WAFERS; TRIBOLOGY;

BIAS; MOS2-TI; S/MO; WORKING PRESSURE;

THIN FILMS;

EID: 33846837388 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2006.09.059 Document Type: Article

Times cited : (49)

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