Positronium diffusion in porous methylsilsesquioxane thin films

Chinese Physics B

Volumn 19, Issue 1, 2010, Pages

  Dong, Xi Jie ^a   Hu, Yi Fan ^a   Wu, Yu Ying ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Low k; Menger sponge model; Porous methylsisesquioxane thin films; Positronium

Indexed keywords

DIFFUSION EQUATIONS; FRACTAL MODEL; LIFETIME SPECTROSCOPY; LOW-K; MEASUREMENT DATA; MENGER SPONGE MODEL; NANO-POROUS; PORE CHARACTERISTICS; POROUS LOW-K; POROUS METHYLSILSESQUIOXANE; POTENTIAL PROBES; SELF-SIMILARITIES; STRUCTURAL CHANGE;

DIELECTRIC MATERIALS; DIFFUSION; FRACTALS; POROUS MATERIALS; POSITRON ANNIHILATION SPECTROSCOPY; POSITRONS; PROBES; RADIATION DAMAGE; THIN FILMS;

COPPER;

EID: 74549206057     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/19/1/013601     Document Type: Article

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