Structural characterization and electro-physical properties for SiOC(-H) low-k dielectric films

Physica B: Condensed Matter

Volumn 404, Issue 23-24, 2009, Pages 5218-5220

  Zakirov, A S ^a   Khabibullaev, P K ^a   Choi, Chi Kyu ^b  

^a S YU YUNUSOV INSTITUTE OF THE CHEMISTRY OF PLANT SUBSTANCES   (Uzbekistan)

^b Jeju National University   (South Korea)

Author keywords

(Si CH3)+ (Si O) defects; Metal insulator semiconductor (MIS) structures; SiOC ( H) low k film; Surface state conditions

Indexed keywords

DEPOSITED FILMS; ELECTRICAL PROPERTY; INTERSTITIAL DEFECTS; LOW DIELECTRIC CONSTANTS; LOW-K DIELECTRIC FILMS; LOW-K FILMS; METAL INSULATOR SEMICONDUCTOR STRUCTURES; OPTICAL EMISSION SPECTRA; POSITIVE CHARGES; SI-H BONDS; SIOC (-H) LOW-K FILM; SIOC(-H) FILMS; STRUCTURAL CHARACTERISTICS; STRUCTURAL CHARACTERIZATION; STRUCTURAL ORDERS;

DIELECTRIC FILMS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC PROPERTIES; EMISSION SPECTROSCOPY; METAL INSULATOR BOUNDARIES; MIS DEVICES; OPTICAL PROPERTIES; OXYGEN; SEMICONDUCTOR INSULATOR BOUNDARIES; SILICON; SURFACE DEFECTS; SWITCHING CIRCUITS;

STRUCTURAL PROPERTIES;

EID: 74349098052     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2009.08.260     Document Type: Article

References (15)

1. Xu Y., Tsai Y., Tu K.N., Zhao B., Liu Q.Z., Brongo M., Sheng G.T.T., and Tung C.H. Appl. Phys. Lett. 75 (1999) 853
2. Ito S., Homma Y., Sasaki E., Uchimara S., and Morishima H. J. Electrochem. Soc. 137 (1990) 1212
3. Yu B.-G., Kim K.-H., Suh K.-S., and Baek J.T. Japan J. Appl. Phys. 35 Pt. 2 (1996) L745
4. Kim K., Kwon D.H., Nallapati G., and Lee G.S. J. Vac. Sci. Tech. A 16 (1998) 1509
5. Kim Y.-H., Kim H.-H., Lee S.-K., Kim H.J., Kim S.-O., and Sohn Y.-S. J. Korean Phys. Soc. 33 (1998) S179
6. Endo K., Shinoda K., and Tatsumi T. J. Appl. Phys. 86 (1999) 2739
7. Janowiak C., Ellingboe S., and Morey I. J. Vac. Sci. Tech. A 18 (2000) 1859
8. Maddalon C., Barla K., Denis E., et al. Microelectron. Eng. 50 (2000) 33
9. Yang C.S., Oh K.S., Ryu J.Y., Kim D.C., Jing S.Y., and Choi C.K. Thin Solid Films 390 (2001) 113
10. Yang C.S., Yu Y.H., Lee K.M., Lee H.J., and Choi C.K. Thin Solid Films 435 (2003) 165
11. Yang C.S., and Choi C.K. Current Appl. Phys. 6 (2006) 243
12. Wong T.K.S., Liu B., Narayanan B., Ligatchev V., and Kumar R. Thin Solid Films 462-463 (2004) 156
13. Maex K., Baklanov M.R., Shamiryan D., Iacopi F., Brongersma S.H., and Yanovitskaya Z.S. J. Appl. Phys. 93 (2003) 8793
14. Zakirov A.S., Navamathavan R., Kim S.H., Jang Y.J., Jung A.S., and Choi C.K. J. Korean Phys. Soc. 49 (2006) 1293
15. Allers K.H. Microelectron. Reliability 44 (2004) 411