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Volumn 6, Issue 2, 2006, Pages 243-247
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Mechanical property of the low dielectric carbon doped silicon oxide thin film grown from MTMS/O2 source
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Author keywords
Elastic modulus; Hardness; Low k; MTMS; SiOC( H) film
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Indexed keywords
CARBON;
ELASTIC MODULI;
FILM GROWTH;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HARDNESS;
NANOSTRUCTURED MATERIALS;
PERMITTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
FLOW RATES;
LOW-K;
NANOINDENTATION;
SIOH (-H) FILMS;
THIN FILMS;
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EID: 27744545698
PISSN: 15671739
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cap.2005.07.049 Document Type: Conference Paper |
Times cited : (16)
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References (17)
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