Oxidation of fluorinated amorphous carbon (a-CFx) films

Langmuir

Volumn 26, Issue 2, 2010, Pages 908-914

  Yun, Yang ^a   Broitman, Esteban ^a   Gellman, Andrew J ^a,b  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b NATIONAL ENERGY TECHNOLOGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBED OXYGEN; CARBON ATOMS; FLUORINATED AMORPHOUS CARBON; FLUORINE ATOMS; FREE-RADICAL SITES; INERT SURFACES; INITIAL STAGES; LANGMUIRS; LOW PRESSURES; OXIDATIVE ETCHING; OXYGEN EXPOSURE; OXYGEN UPTAKE; PARTIAL SURFACES; PREFERENTIAL OXIDATION; ROOM TEMPERATURE; STICKING COEFFICIENTS; TECHNOLOGICAL APPLICATIONS; UNSATURATED DOUBLE BONDS; X RAY PHOTOEMISSION SPECTROSCOPY; X-RAY PHOTOEMISSION SPECTRA;

ADSORPTION; ATMOSPHERIC PRESSURE; ATOMS; EMISSION SPECTROSCOPY; FLUORINE; FREE RADICALS; NITROGEN; ORGANIC POLYMERS; OXIDATION; OXYGEN; PHOTOEMISSION; REFLECTIVE COATINGS;

AMORPHOUS CARBON;

CARBON; FLUORINE; NITROGEN; OXYGEN;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; OXIDATION REDUCTION REACTION; SPECTROMETRY;

CARBON; FLUORINE; MEMBRANES, ARTIFICIAL; NITROGEN; OXIDATION-REDUCTION; OXYGEN; SPECTROMETRY, X-RAY EMISSION;

EID: 74249088460     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la902375f     Document Type: Article

References (22)

1. Ayala, P.; Maia da Costa, M. E. H.; Prioli, R.; Freire, J. F. L. Surf. Coat. Technol. 2004, 182 (2-3), 335.
2. Donnet, C.; Fontaine, J.; Grill, A.; Patel, V.; Jahnes, C.; Belin, M. Surf. Coat. Technol 1997, 94-95, 531.
3. Maia da Costa, M. E. H.; Sanchez, C. M. T.; Jacobsohn, L. G.; Freire, J. F. L. Thin Solid Films 2005, 482(1-2), 109.
4. Matsumoto, Y.; Ishida, M. Sens. Actuators, A 2000, 83(1-3), 179-185.
5. Kim, S. H.; Kim, J. H.; Kang, B. K.; Uhm, H. S. Langmuir 2005, 21(26), 12213-12217.
6. Zhou, Y.; Wang, B.; Zhang, X. H.; Zhao, M.; Li, E.; Yan, H. Colloids Surf., A 2009, 335(1-3), 128-132.
7. Sui, J. H.; Zhang, Z. G.; Cai, W. Nucl. Instrum. Methods Phys. Res., Sect. B 2009, 267(15), 2475-2479.
8. Lewis, F.; Horny, P.; Hale, P.; Turgeon, S.; Tatoulian, M.; Mantovani, D. J. Phys. D: Appl. Phys. 2008, 41 (4).
9. Tong, S. W.; Fung, M. K.; Lee, C. S.; Lifshitz, Y.; Lee, S. T.; Hoffman, A. Appl. Surf. Sci. 2003, 220(1-4), 19-25.
10. Biloiua, C.; Biloiua, I. A.; Sakai, Y.;Suda, Y.; Ohta, A. J. Vac. Sci. Technol. A 2004, 22(1), 13.
11. Chang, J. P.; Krautter, H. W.; Zhu, W.; Opila, R. L.; Pai, C. S. J. Vac. Sci. Technol. A 1999, 17(5), 1969.
12. Ishikawa, K.; Kobayashi, S.; Okigawa, M.; Sekine, M. Appl. Phys. Lett. 2002, 81(10), 1773.
13. Yun, Y.; Broitman, E.; Gellman, A. J. Langmuir 2007, 23(4), 1953.
14. Yun, Y.; Broitman, E.; Gellman, A. J. Tribol. Lett. 2007, 26(1), 45.
15. Yun, Y.; Ma, X.; Gui, J.; Broitman, E.; Gellman, A. J. Langmuir 2007, 23 (10), 5485.
16. Gilkes, K. W. R.; Sands, H. S.; Batchelder, D. N.; Robertson, J.; Milne, W. I. Appl. Phys. Lett. 1997, 70(15), 1980.
17. Lifshitz, Y. In Diamond-like carbon-present status; Elsevier: Pretoria, South. Africa, 1999; p 1659.
18. Seong, M. R.; Lee, G. Y.; Cho, S. H.; Lim, H. W.; Park, J. G.; Lee, C. S. Mater. Trans. 2009, 50(2), 332-334.
19. Filik, J.; May, P. W.; Pearce, S. R. J.; Wild, R. K.; Hallam, K. R. Diamond Relat. Mater. 2003, 12, 974.
20. Moulder, J. F.; Stickle, W. F.; Sobol, P. E.; Bomben, K. D. Handbook of X-ray Photoelectron Spectroscopy; Perkin-Elmer Corp.: Minneapolis, 1992.
21. Strozier, A., Jr.; Cosgrove, G. J.; Fischer, D. A. Surf. Sci. 1979, 82(2), 481.
22. Yang, R. T.; Wong, C. J. Chem. Phys. 1981, 75(9), 4471.