The modifications of the surface wettability of amorphous carbon films

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 335, Issue 1-3, 2009, Pages 128-132

  Zhou, Ying ^a   Wang, Bo ^a   Zhang, Xuehong ^a   Zhao, Mei ^a   Li, Er ^a   Yan, Hui ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Amorphous carbon; Plasma; Superhydrophobic; Wettability

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; HYDROPHILICITY; HYDROPHOBICITY; PLASMA APPLICATIONS; PLASMA STABILITY; PLASMAS; SURFACE CHEMISTRY; SURFACE TREATMENT;

AMORPHOUS CARBON FILMS; APPLICATIONS.; AQUEOUS SOLUTIONS; C FILMS; DEPOSITION PARAMETERS; GLASS SUBSTRATES; GOOD STABILITIES; HYDROPHOBIC PROPERTIES; HYDROPHOBIC SURFACES; MAGNETRON SPUTTERING METHODS; PH VALUES; PLASMA TREATMENTS; SOLID SURFACES; STRUCTURED SURFACES; SUPERHYDROPHOBIC; SURFACE WETTABILITIES; WETTABILITY;

SURFACE PROPERTIES;

CARBON; GLASS; NANOFILM; SILICON;

AQUEOUS SOLUTION; ARTICLE; CHEMICAL MODIFICATION; FILM; HYDROPHILICITY; HYDROPHOBICITY; MICROWAVE OVEN; PH; PRIORITY JOURNAL; SURFACE PROPERTY; WETTABILITY;

EID: 58149522101     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2008.10.047     Document Type: Article

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