Investigation on structural, electrical and optical properties of tungsten-doped tin oxide thin films

Thin Solid Films

Volumn 518, Issue 8, 2010, Pages 1892-1896

  Huang, Yanwei ^a   Li, Guifeng ^a   Feng, Jiahan ^a   Zhang, Qun ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Electrical and optical properties; Thin films; Transparent conductive oxide (TCO); Tungsten doped tin oxide

Indexed keywords

ANNEALING TEMPERATURES; CHEMICAL STATE; DOPING CONTENT; ELECTRICAL AND OPTICAL PROPERTIES; NEAR INFRARED REGION; OPTICAL TRANSMITTANCE; POST ANNEALING; PULSED PLASMA DEPOSITION; QUARTZ SUBSTRATE; TIN OXIDE THIN FILM; TRANSPARENT CONDUCTIVE FILMS; TRANSPARENT CONDUCTIVE OXIDE (TCO); TRANSPARENT CONDUCTIVE OXIDES; VISIBLE REGION;

ANNEALING; CARRIER CONCENTRATION; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; DOPING (ADDITIVES); ELECTRIC PROPERTIES; OPTICAL PROPERTIES; OXIDE FILMS; OXIDE MINERALS; PLASMA DEPOSITION; QUARTZ; THIN FILMS; TIN; TITANIUM COMPOUNDS; TUNGSTEN;

OPTICAL FILMS;

EID: 73949141539     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.119     Document Type: Article

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