Preparation and characterization of single crystalline SnO2 films deposited on α-Al2O3 (0001) by MOCVD

Materials Letters

Volumn 62, Issue 12-13, 2008, Pages 1809-1811

  Feng, Xianjin ^a   Ma, Jin ^a   Yang, Fan ^a   Ji, Feng ^a   Luan, Caina ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

Electrical properties; Epitaxial growth; MOCVD; SnO2 thin films

Indexed keywords

DEPOSITION; EPITAXIAL GROWTH; LIGHT TRANSMISSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; THIN FILMS; TITANIUM DIOXIDE;

EPITAXIAL RELATIONSHIP; SINGLE CRYSTALLINE FILMS; SINGLE CRYSTALLINE STRUCTURE; TETRAGONAL RUTILE STRUCTURE;

SINGLE CRYSTALS;

EID: 39049133268     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2007.10.007     Document Type: Article

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