X-ray study of tin oxide films obtained by reactive DC sputtering from a metallic tin target in pure oxygen plasma

Surface and Coatings Technology

Volumn 201, Issue 8, 2007, Pages 4659-4665

  Martel, A ^a   Caballero Briones, F ^b   Quintana, P ^c   Bartolo Perez P ^c   Pena J L ^c  

^a UNIVERSIDAD AUTÓNOMA DE YUCATÁN   (Mexico)

^b INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^c DEPARTAMENTO DE FÍSICA APLICADA   (Mexico)

Author keywords

Reactive sputtering; Thin films; Tin oxide; X ray diffraction

Indexed keywords

CRYSTAL ORIENTATION; METALLIC FILMS; OXYGEN; SPUTTER DEPOSITION; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

DC-MAGNETRON SPUTTERING; GRAZING INCIDENCE; TIN OXIDE FILMS;

MAGNETRON SPUTTERING;

CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; METALLIC FILMS; OXYGEN; SPUTTER DEPOSITION; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

EID: 33845564950     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.10.001     Document Type: Article

References (19)

1. Minami T. Semicond. Sci. Technol. 20 (2005) S35
2. Orobei O., Shishkin N.Ya., and Saroka V.V. Instrum. Exp. Tech. 47 3 (2004) 415
3. Cássia-Santos M.R., Sousa V.C., Oliveira M.M., Sensato F.R., Bacelar W.K., Gomes J.W., Longo E., Leite E.R., and Varela J.A. Mater. Chem. Phys. 90 (2005) 1
4. Sangaletti L., Depero L.E., Allieri B., Pioselli F., Comini E., Sberveglieri G., and Zocchi M. J. Mater. Res. 13 (1998) 2457
5. Snyders R., Wautelet M., Gouttebaron R., Dauchot J.P., and Hecq M. Surf. Coat. Technol. 142-144 (2001) 187
6. Greenwood N.N., and Earnshaw A. Chemistry of the Elements (1984), Pergamon Press
7. Cahen S., David N., Fiorani J.M., Maitre A., and Vilasi M. Thermochim. Acta 403 (2003) 275
8. Martel A., Caballero-Briones F., Fandiño J., Castro-Rodríguez R., Bartolo-Pérez P., Zapata-Navarro A., Zapata-Torres M., and Peña J.L. Surf. Coat. Technol. 122 (1999) 136
9. Martel A., Caballero-Briones F., Iribarren A., Castro-Rodríguez R., Bartolo-Pérez P., and Peña J.L. Surf. Coat. Technol. 148 (2001) 103
10. ICCD. JCPDS-International Center for Diffraction Data (2000) 41-1445
11. ICCD. JCPDS-International Center for Diffraction Data (2000) 06-0395
12. Gracia F., Holgado J.P., and González-Elipe A.R. Langmuir 20 (2004) 1688
13. Jiménez V.M., Espinós J.P., Caballero A., Contreras L., Fernández A., Justo A., and González-Elipe A.R. Thin Solid Films 353 (1999) 113
14. Harris B. Philos. Mag. 43 (1952) 133
15. Williamson G.K., and Hall W.H. Acta Metall. 1 (1953) 22
16. Braithwaite N.St.J. Plasma Sources Sci. Technol. 9 (2000) 517
17. Nanbu K., Mitsui K., and Kondo S. J. Phys. D: Appl. Phys. 33 (2000) 2274
18. Batzill M., and Diebold U. Prog. Surf. Sci. 79 (2005) 47
19. Rao B.B., and Rao V.J. J. Mater. Sci. Lett. 18 (1999) 1493