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Journal of the Electrochemical Society

Volumn 157, Issue 2, 2010, Pages

Characterization and growth kinetics of Electroless pure Nickel thin films on Si(001) substrates

(2) Cheng, S L a Peng, H C a

a NATIONAL CENTRAL UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; ELECTROLESS; ELECTROLESS NI; GROWTH BEHAVIOR; NI FILMS; NICKEL THIN FILM; POLYCRYSTALLINE STRUCTURE; SI (001) SUBSTRATE; SI SUBSTRATES; SYSTEMATIC INVESTIGATIONS;

ACTIVATION ENERGY; ARRHENIUS PLOTS; GROWTH KINETICS; NICKEL ALLOYS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THIN FILMS;

SUBSTRATES;

EID: 73849110484 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3263266 Document Type: Article

Times cited : (10)

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