Electroless deposition, post annealing and characterization of nickel films on silicon

Bulletin of Materials Science

Volumn 31, Issue 5, 2008, Pages 729-736

  Sabharwal, Subir ^b,c   Palit, Siddharth ^b   Tokas, R B ^a   Poswal, A K ^a   Sangeeta, ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

^c Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

Electroless deposition; Nickel film; Scanning probe microscopy; X ray diffraction

Indexed keywords

ANNEALING; CRYSTAL ATOMIC STRUCTURE; DIFFRACTION; ELECTRIC PROPERTIES; ELECTROLESS PLATING; METALLIC FILMS; MICROSCOPIC EXAMINATION; NICKEL; NICKEL ALLOYS; OHMIC CONTACTS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR JUNCTIONS; SILICON; X RAY ANALYSIS; X RAY DIFFRACTION;

ATOMIC FORCES; COMPARATIVE STUDIES; DIFFERENT PROCESSES; ELECTRICAL PROPERTIES; ELECTROLESS; ELECTROLESS DEPOSITION; ELECTROLESS DEPOSITIONS; NICKEL FILM; NICKEL FILMS; SCANNING PROBE MICROSCOPY; SEMI-CONDUCTORS; SILICON SUBSTRATES; SPUTTERED FILMS; SUBSTRATE HEATING; X-RAY DIFFRACTIONS;

SUBSTRATES;

EID: 55649084420     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-008-0115-0     Document Type: Article

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