Temperature and pH dependence of the electroless Ni-P deposition on silicon

Thin Solid Films

Volumn 510, Issue 1-2, 2006, Pages 102-106

  Liu, W L ^a   Hsieh, S H ^a   Tsai, T K ^a   Chen, W J ^b   Wu, Shin Shyan ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL PINGTUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Electroless deposition; Nickel; Scanning electron microscopy

Indexed keywords

ACTIVATION ANALYSIS; ATOMIC FORCE MICROSCOPY; PH EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICON; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

SENSITIZATION; SILICON SURFACES; SODIUM HYDROPHOSPHITE;

ELECTROLESS PLATING;

EID: 33646402336     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.203     Document Type: Article

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