Optical and electrical properties of TixSi1-xO y films

ETRI Journal

Volumn 31, Issue 6, 2009, Pages 675-679

  Lim, Jung Wook ^a   Yun, Sun Jin ^a   Kim, Je Ha ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

AR coating; Nonlinear I V curve; Refractive index; Solar cell; TiSiO

Indexed keywords

AR COATINGS; COATING LAYER; I - V CURVE; NONLINEAR COEFFICIENT; NONLINEAR I-V CURVE; OPTICAL AND ELECTRICAL PROPERTIES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SI WAFER; SUB-CYCLE; THIN FILM SOLAR CELLS; TI CONTENT; TIO;

ANTIREFLECTION COATINGS; COATINGS; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC PROPERTIES; FILM THICKNESS; LIGHT REFRACTION; ORGANIC POLYMERS; REFRACTIVE INDEX; REFRACTOMETERS; SILICON; SILICON WAFERS; SOLAR CELLS; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 73449113687     PISSN: 12256463     EISSN: None     Source Type: Journal    
DOI: 10.4218/etrij.09.1209.0033     Document Type: Article

References (17)

1. O. Auciello et al., "Hybrid Titanium-Aluminum Oxide Layer as Alternative High-k Gate Dielectric for the Next Generation of Complementary Metal-Oxide-Semiconductor Devices," Appl. Phys. Lett.,vol.86,no. 4, Jan. 2005,pp.042904 1-3.
2. J.W. Lim, S.J. Yun, and H.T. Kim, "Characteristics of AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition," J. Electro chemical Society,vol.154,no.11,Nov.2007,pp.G239-G243.
3. 2 Films Grown by Atomic Layer Deposition," J. Appl. Phys.,vol.92,no.12,Dec.2002,pp.7675-7677.
4. M.L. Kuo et al., "Realization of a Near-Perfect Antireflection Coating for Silicon Solar Energy Utilization," Optics Letters, vol.33, no.21, Nov. 2008, pp. 2527-2529.
5. J.Q. Xi et al., "Optical Thin Film Materials with Low Refractive Index for Broadband Elimination of Fresnel Reflection," Nature Photonics, vol.1, no.3, Mar. 2007, pp. 176-179.
6. 2/ZnO Antireflection Coating," Appl. Phys. Lett., vol. 88, no. 18, May 2006, pp. 183508 1-3.
7. Y.J. Lee et al., "ZnO Nanostructures as Efficient Antireflection Layers in Solar Cell," Nano Letters, vol.8, no.5, May 2008, pp. 1501-1505.
8. M. Barrera et al., "Antireflecting-Passivating Dielectric Films on Crystalline Silicon Solar Cells for Space Applications," Solar Energy Materials & Solar Cells, vol.92, no.9, Sept. 2008, pp. 1115-1122.
9. J.H. Shin et al., "Light Effects on the Bias Stability of Transparent ZnO Thin Film Transistors," ETRI Journal, vol.31, no.1, Feb. 2009, pp. 62-64.
10. J. Dupuis et al., "Impact of PECVD SiON Stoichiometry and Post-annealing on the Silicon Surface Passivation," Thin Solid Films, vol.516, no.20, Aug. 2008, pp. 6954-6958.
11. W. Zhou et al., "Microstructured Surface Design for Omnidirectional Antireflection Coatings on Solar Cells," J. Appl. Phys., vol.102, no.10, Nov. 2007, pp. 103105 1-9.
12. 2 Varistor," Materials Letters, vol.60, no.12, June 2006, pp. 1554-1557.
13. J.W. Lim, S.J. Yun, and J.H. Lee, "Characteristics of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition," Electrochemical and Sold-State Letters, vol.8, no.9, Sept. 2005, pp. F25-F28.
14. 2/ZnO Antireflection Coating," Appl. Phys.Lett.,vol.88,no.18,May2006,pp.1835081- 3.
15. J.W. Lim, S.J. Yun, and H.T. Kim, "Optical AlxTi1-xOy Films Grown by Plasma Enhanced Atomic Layer Deposition," Japanese Journal ofAppliedPhysics,vol.47,no.8,Aug.2008,pp.6934-6937.
16. J. Ushida et al., "Systematic Design of Antireflection Coating for Semi-infinite One-Dimensional Photonic Crystals Using Bloch WaveExpansion, "Appl.Phys.Lett.,vol.82,no.1,Jan.2003,pp.7-9.
17. 3," Appl. Phys. Lett., vol.86, no.6, Feb. 2005, pp. 062903 1-3.