Impact of PECVD SiON stoichiometry and post-annealing on the silicon surface passivation

Thin Solid Films

Volumn 516, Issue 20, 2008, Pages 6954-6958

  Dupuis, J ^a   Fourmond, E ^a   Lelievre J F ^a   Ballutaud, D ^b   Lemiti, M ^a  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^b CNRS   (France)

Author keywords

FTIR; SiON; Solar cells; Surface passivation; XPS

Indexed keywords

ANNEALING; ANTIREFLECTION COATINGS; CUBIC BORON NITRIDE; DIRECT ENERGY CONVERSION; NITRIDES; NONMETALS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON NITRIDE; SOLAR ENERGY; STOICHIOMETRY; SURFACES; THIN FILMS;

(100) SILICON; ANTIREFLECTION (AR); CHEMICAL VAPOUR DEPOSITION; GAS FLOWING; HYDROGENATED SILICON; LOW FREQUENCY (LF); MULTILAYER (ML); PASSIVATION EFFECTS; PASSIVATION LAYERS; POSTANNEALING (PA); SILICON (0 0 1) SURFACES; SILICON SURFACE PASSIVATION;

PASSIVATION;

EID: 45849099163     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.12.026     Document Type: Article

References (23)

1. del Prado A., San Andrés E., Martĺnez F.L., Mártil I., González-Dĺaz G., Bohne W., Röhrich J., Selle B., and Fernández M. Vacuum 67 (2002) 507
2. Wang Y., Cheng X., Lin Z., Zhang C., and Zhang F. Vacuum 72 (2004) 345
3. Wörhoff K., Driessen A., Lambeck P.V., Hilderink L.T.H., Linders P.W.C., and Popma Th.J.A. Sens. Actuators 74 (1999) 9
4. J.F. Lelièvre, PhD Thesis, Institut des Nanotechnologies de Lyon, INSA de Lyon, France, 2007.
5. Lipiński M., Kaminski A., Lelièvre J.F., Lemiti M., Fourmond E., and Zieba P. Phys. Status Solidi 4 (2007) 1566
6. Hofmann M., Schneiderlöchner E., Wolke W., and Preu R. 19th European Photovoltaic Solar Energy Conference Proceeding, Paris, France, 7-11 June (2004) 1037
7. Gellison Jr. G.E., and Modine F.A. Appl. Phys. Lett. 69 (1996) 371
8. Sinton R., and Cuevas A. Appl. Phys. Lett. 69 17 (1996) 2510
9. Alayo M.I., Pereyra I., Scopel W.L., and Fantini M.C.A. Thin Solid Films 402 (2002) 154
10. S. Naskar, PhD Thesis, Case Western Reserve University, Cleveland, United States, 2006.
11. Józwik M., Delobelle P., Gorecki C., Sabac A., Nieradko L., Meunier C., and Munnik F. Thin Solid Films 468 (2004) 84
12. Aberle A.G. Prog. Photovolt. : Res. Appl. 8 (2000) 473
13. Afanasyev-Charkin I.V., Jacobsohn L.G., Averitt R.D., and Nastasi M. J. Vac. Sci. Technol. 22 (2004) 2342
14. Bustarret E., Bensouda M., Habrard M.C., and Bruyère J.C. Phys. Rev. B38 (1988) 8171
15. Ay F., and Aydinli A. Opt. Mater. 26 (2004) 33
16. Pereyra I., and Alayo M.I. J. Non-Crys. Solids 212 (1997) 225
17. Dreer S., and Wilhartitz P. Pure Appl. Chem. 76 (2004) 1161
18. B. deB. Darwent. Bond Dissociation Energies in Simple Molecules, National Standard Reference Data Series No. 31, National Bureau of Standards, U.S. Government Printing Office, Washington, D.C. (1970)
19. R.C. Weast, M.J. Astle, Handbook of Chemistry and Physics, 62nd ed., CRC Press, Boca Raton, Florida, 1981-1982.
20. Lelièvre J.F., Rozier Y., Bernaudeau A., Palais O., Kaminski A., Quoizola S., Nichiporuk O., Bérenguer M., Girard P., Loretz J.-C., Giral C., Pellegrin Y., and Lemiti M. 15th International Photovoltaic Science and Engineering Conference & Solar Energy Exhibition, Shanghai, China, 10-15 October (2005) 124
21. Girisch R.B.M., Mertens R.P., and De Keersmaecker R.F. IEEE Trans. Electron Devices 35 (1988) 203
22. Aberle A.G. Sol. Energy Mater. Sol. Cells 65 (2001) 239
23. Dekkers H.F.W., Carnel L., Beaucarne G., and Beyer W. 20th European Photovoltaic Solar Energy Conference, Barcelona, Spain, 6-10 June (2005) 721