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Japanese Journal of Applied Physics

Volumn 47, Issue 8 PART 3, 2008, Pages 6934-6937

Optical AlxTi1-xOy films grown by plasma enhanced atomic layer deposition

(3) Lim, Jung Wook a Yun, Sun Jin a Kim, Hyun Tak a

a Electronics and Telecommunications Research Institute (ETRI) (South Korea)

Author keywords

Antireflection coating; ATO; PEALD

Indexed keywords

ALUMINUM; ANTIREFLECTION COATINGS; ATOMIC PHYSICS; ATOMS; OPTICAL FILTERS; OPTICAL PROPERTIES; PLASMA DEPOSITION; PLASMAS; PULSED LASER DEPOSITION; REFRACTIVE INDEX;

ATO; ATOMIC LAYERS; COATING LAYERS; HIGH REFLECTIVITIES; NUMBER OF CYCLES; OPTICAL THICKNESSES; OPTICAL-; PEALD; THICKNESS OF FILMS;

ATOMIC LAYER DEPOSITION;

EID: 55149106761 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.6934 Document Type: Article

Times cited : (9)

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