메뉴 건너뛰기




Volumn 95, Issue 22, 2009, Pages

Transparent photostable ZnO nonvolatile memory transistor with ferroelectric polymer and sputter-deposited oxide gate

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRIC LAYERS; FERROELECTRIC POLYMERS; GATE ELECTRODES; GATED DEVICES; INDIUM ZINC OXIDES; LOW VOLTAGES; NON-VOLATILE MEMORIES; NON-VOLATILE MEMORY TRANSISTORS; PHOTOSTABLE; RETENTION PROPERTIES; RF-SPUTTERING; TOP-GATE; ZNO;

EID: 71949122446     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3269576     Document Type: Article
Times cited : (34)

References (19)
  • 1
    • 0036646284 scopus 로고    scopus 로고
    • Why is nonvolatile ferroelectric memory field-effect transistor still elusive?
    • DOI 10.1109/LED.2002.1015207, PII S0741310602053491
    • T. P. Ma and J. -P. Han, IEEE Electron Device Lett. 0741-3106 23, 386 (2002). 10.1109/LED.2002.1015207 (Pubitemid 34830367)
    • (2002) IEEE Electron Device Letters , vol.23 , Issue.7 , pp. 386-388
    • Ma, T.P.1    Han, J.-P.2
  • 3
    • 34948832812 scopus 로고    scopus 로고
    • Characterization of metal-ferroelectric (BiFe O3) -insulator (Zr O2) -silicon capacitors for nonvolatile memory applications
    • DOI 10.1063/1.2794335
    • Y. -W. Chiang and J. -M. Wu, Appl. Phys. Lett. 0003-6951 91, 142103 (2007). 10.1063/1.2794335 (Pubitemid 47531502)
    • (2007) Applied Physics Letters , vol.91 , Issue.14 , pp. 142103
    • Chiang, Y.-W.1    Wu, J.-M.2
  • 5
    • 32044451564 scopus 로고    scopus 로고
    • Self-aligned-gate metal/ferroelectric/insulator/semiconductor field-effect transistors with long memory retention
    • DOI 10.1143/JJAP.44.L800
    • M. Takahashi and S. Sakai, Jpn. J. Appl. Phys., Part 2 0021-4922 44, L800 (2005). 10.1143/JJAP.44.L800 (Pubitemid 43200756)
    • (2005) Japanese Journal of Applied Physics, Part 2: Letters , vol.44 , Issue.24-27
    • Takahashi, M.1    Sakai, S.2
  • 9
    • 34249886783 scopus 로고    scopus 로고
    • Recovery of remanent polarization of poly(vinylidene fluoride-co- trifluoroethylene) thin film after high temperature annealing using topographically nanostructured aluminium bottom electrode
    • DOI 10.1063/1.2743389
    • Y. J. Park, S. J. Kang, E. Woo, K. Shin, K. J. Kim, and C. Park, Appl. Phys. Lett. 0003-6951 90, 222903 (2007). 10.1063/1.2743389 (Pubitemid 46872639)
    • (2007) Applied Physics Letters , vol.90 , Issue.22 , pp. 222903
    • Park, Y.J.1    Kang, S.J.2    Park, C.3    Woo, E.4    Shin, K.5    Kim, K.J.6
  • 10
    • 34247352481 scopus 로고    scopus 로고
    • Low-voltage operation of ferroelectric poly(vinylidene fluoridetrifluoroethylene) copolymer capacitors and metal-ferroelectric- insulator-semiconductor diodes
    • DOI 10.1063/1.2723678
    • S. Fujisaki, H. Ishiwara, and Y. Fujisaki, Appl. Phys. Lett. 0003-6951 90, 162902 (2007). 10.1063/1.2723678 (Pubitemid 46644848)
    • (2007) Applied Physics Letters , vol.90 , Issue.16 , pp. 162902
    • Fujisaki, S.1    Ishiwara, H.2    Fujisaki, Y.3
  • 13
    • 0038136910 scopus 로고    scopus 로고
    • Transparent electronics
    • DOI 10.1126/science.1085276
    • J. F. Wager, Science 0036-8075 300, 1245 (2003). 10.1126/science.1085276 (Pubitemid 36618226)
    • (2003) Science , vol.300 , Issue.5623 , pp. 1245-1246
    • Wager, J.F.1
  • 15
    • 9744248669 scopus 로고    scopus 로고
    • Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
    • DOI 10.1038/nature03090
    • K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature (London) 0028-0836 432, 488 (2004). 10.1038/nature03090 (Pubitemid 39585210)
    • (2004) Nature , vol.432 , Issue.7016 , pp. 488-492
    • Nomura, K.1    Ohta, H.2    Takagi, A.3    Kamiya, T.4    Hirano, M.5    Hosono, H.6
  • 19


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.