-
1
-
-
0036646284
-
Why is nonvolatile ferroelectric memory field-effect transistor still elusive?
-
DOI 10.1109/LED.2002.1015207, PII S0741310602053491
-
T. P. Ma and J. -P. Han, IEEE Electron Device Lett. 0741-3106 23, 386 (2002). 10.1109/LED.2002.1015207 (Pubitemid 34830367)
-
(2002)
IEEE Electron Device Letters
, vol.23
, Issue.7
, pp. 386-388
-
-
Ma, T.P.1
Han, J.-P.2
-
3
-
-
34948832812
-
Characterization of metal-ferroelectric (BiFe O3) -insulator (Zr O2) -silicon capacitors for nonvolatile memory applications
-
DOI 10.1063/1.2794335
-
Y. -W. Chiang and J. -M. Wu, Appl. Phys. Lett. 0003-6951 91, 142103 (2007). 10.1063/1.2794335 (Pubitemid 47531502)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.14
, pp. 142103
-
-
Chiang, Y.-W.1
Wu, J.-M.2
-
5
-
-
32044451564
-
Self-aligned-gate metal/ferroelectric/insulator/semiconductor field-effect transistors with long memory retention
-
DOI 10.1143/JJAP.44.L800
-
M. Takahashi and S. Sakai, Jpn. J. Appl. Phys., Part 2 0021-4922 44, L800 (2005). 10.1143/JJAP.44.L800 (Pubitemid 43200756)
-
(2005)
Japanese Journal of Applied Physics, Part 2: Letters
, vol.44
, Issue.24-27
-
-
Takahashi, M.1
Sakai, S.2
-
6
-
-
27744512125
-
-
0003-6951. 10.1063/1.2132062
-
R. C. G. Naber, B. de Boer, P. W. M. Blom, and D. M. de Leeuw, Appl. Phys. Lett. 0003-6951 87, 203509 (2005). 10.1063/1.2132062
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 203509
-
-
Naber, R.C.G.1
De Boer, B.2
Blom, P.W.M.3
De Leeuw, D.M.4
-
7
-
-
71849090334
-
-
0935-9648.
-
K. H. Lee, G. Lee, K. Lee, M. S. Oh, S. Im, and S. M. Yoon, Adv. Mater. 0935-9648 21, 4287 (2009).
-
(2009)
Adv. Mater.
, vol.21
, pp. 4287
-
-
Lee, K.H.1
Lee, G.2
Lee, K.3
Oh, M.S.4
Im, S.5
Yoon, S.M.6
-
8
-
-
62149140097
-
-
0003-6951. 10.1063/1.3089379
-
K. H. Lee, G. Lee, K. Lee, M. S. Oh, and S. Im, Appl. Phys. Lett. 0003-6951 94, 093304 (2009). 10.1063/1.3089379
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 093304
-
-
Lee, K.H.1
Lee, G.2
Lee, K.3
Oh, M.S.4
Im, S.5
-
9
-
-
34249886783
-
Recovery of remanent polarization of poly(vinylidene fluoride-co- trifluoroethylene) thin film after high temperature annealing using topographically nanostructured aluminium bottom electrode
-
DOI 10.1063/1.2743389
-
Y. J. Park, S. J. Kang, E. Woo, K. Shin, K. J. Kim, and C. Park, Appl. Phys. Lett. 0003-6951 90, 222903 (2007). 10.1063/1.2743389 (Pubitemid 46872639)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.22
, pp. 222903
-
-
Park, Y.J.1
Kang, S.J.2
Park, C.3
Woo, E.4
Shin, K.5
Kim, K.J.6
-
10
-
-
34247352481
-
Low-voltage operation of ferroelectric poly(vinylidene fluoridetrifluoroethylene) copolymer capacitors and metal-ferroelectric- insulator-semiconductor diodes
-
DOI 10.1063/1.2723678
-
S. Fujisaki, H. Ishiwara, and Y. Fujisaki, Appl. Phys. Lett. 0003-6951 90, 162902 (2007). 10.1063/1.2723678 (Pubitemid 46644848)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.16
, pp. 162902
-
-
Fujisaki, S.1
Ishiwara, H.2
Fujisaki, Y.3
-
11
-
-
70350070411
-
-
0003-6951. 10.1063/1.3247881
-
C. H. Park, G. Lee, K. H. Lee, K. Lee, B. H. Lee, S. M. Sung, and S. Im, Appl. Phys. Lett. 0003-6951 95, 153502 (2009). 10.1063/1.3247881
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 153502
-
-
Park, C.H.1
Lee, G.2
Lee, K.H.3
Lee, K.4
Lee, B.H.5
Sung, S.M.6
Im, S.7
-
13
-
-
0038136910
-
Transparent electronics
-
DOI 10.1126/science.1085276
-
J. F. Wager, Science 0036-8075 300, 1245 (2003). 10.1126/science.1085276 (Pubitemid 36618226)
-
(2003)
Science
, vol.300
, Issue.5623
, pp. 1245-1246
-
-
Wager, J.F.1
-
14
-
-
16244382410
-
Fully transparent ZnO thin-film transistor produced at room temperature
-
DOI 10.1002/adma.200400368
-
E. M. C. Fortunato, P. M. C. Barquinha, A. C. M. B. G. Pimentel, A. M. F. Goncalves, A. J. S. Marques, L. M. N. Pereira, and R. F. P. Martins, Adv. Mater. 0935-9648 17, 590 (2005). 10.1002/adma.200400368 (Pubitemid 40448713)
-
(2005)
Advanced Materials
, vol.17
, Issue.5
, pp. 590-594
-
-
Fortunato, E.M.C.1
Barquinha, P.M.C.2
Pimentel, A.C.M.B.G.3
Goncalves, A.M.F.4
Marques, A.J.S.5
Pereira, L.M.N.6
Martins, R.F.P.7
-
15
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature (London) 0028-0836 432, 488 (2004). 10.1038/nature03090 (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
16
-
-
62149135401
-
-
1616-301X. 10.1002/adfm.200801155
-
M. S. Oh, K. Lee, K. H. Lee, S. H. Cha, J. M. Choi, B. H. Lee, M. M. Sung, and S. Im, Adv. Funct. Mater. 1616-301X 19, 726 (2009). 10.1002/adfm.200801155
-
(2009)
Adv. Funct. Mater.
, vol.19
, pp. 726
-
-
Oh, M.S.1
Lee, K.2
Lee, K.H.3
Cha, S.H.4
Choi, J.M.5
Lee, B.H.6
Sung, M.M.7
Im, S.8
-
17
-
-
57349101496
-
-
0003-6951. 10.1063/1.3041643
-
J. W. Seo, J-. W. Park, K. S. Lim, J-. H. Yang, and S. J. Kang, Appl. Phys. Lett. 0003-6951 93, 223505 (2008). 10.1063/1.3041643
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 223505
-
-
Seo, J.W.1
Park -., J.W.2
Lim, K.S.3
Yang -., J.H.4
Kang, S.J.5
-
18
-
-
55149107223
-
-
0003-6951. 10.1063/1.3012386
-
H. Yin, S. Kim, C. J. Kim, I. Song, J. Park, S. Kim, and Y. Park, Appl. Phys. Lett. 0003-6951 93, 172109 (2008). 10.1063/1.3012386
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 172109
-
-
Yin, H.1
Kim, S.2
Kim, C.J.3
Song, I.4
Park, J.5
Kim, S.6
Park, Y.7
-
19
-
-
5044248801
-
-
0042-207X. 10.1016/j.vacuum.2004.05.003
-
Y. Abe, T. Hasegawa, M. Kawamura, and K. Sasaki, Vacuum 0042-207X 76, 1 (2004). 10.1016/j.vacuum.2004.05.003
-
(2004)
Vacuum
, vol.76
, pp. 1
-
-
Abe, Y.1
Hasegawa, T.2
Kawamura, M.3
Sasaki, K.4
|