The effect of the CH4 level on the morphology, microstructure, phase purity and electrochemical properties of carbon films deposited by microwave-assisted CVD from Ar-rich source gas mixtures

Diamond and Related Materials

Volumn 18, Issue 12, 2009, Pages 1426-1434

  Show, Yoshiyuki ^a   Swope, Vernon M ^a   Swain, Greg M ^a  

^a MICHIGAN STATE UNIVERSITY   (United States)

Author keywords

Electrochemistry; Film morphology and microstructure; Nanocrystalline diamond

Indexed keywords

BACKGROUND CURRENT; BORON-DOPED; BORON-DOPING; CARBON MICROSTRUCTURES; CARBON THIN FILMS; CONCENTRATION OF; DIAMOND-LIKE CARBON; ELECTROCHEMICAL BEHAVIORS; ELECTROCHEMICAL MEASUREMENTS; ELECTROCHEMICAL METHODS; EMISSION INTENSITY; FILM MORPHOLOGY; FILM MORPHOLOGY AND MICROSTRUCTURE; GRAIN SIZE; HIGH-QUALITY DIAMONDS; MICROCRYSTALLINE DIAMOND; MICROWAVE-ASSISTED; MOLECULAR ADSORPTION; NANOCRYSTALLINE DIAMONDS; NANOCRYSTALLINE GRAPHITE; OPTICAL EMISSION INTENSITY; PHASE PURITY; POTENTIAL WINDOWS; SEM; SI SUBSTRATES; SOURCE GAS; STRUCTURAL STUDIES; SWAN BAND; TEM; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE DIAMONDS; VOLTAMMETRIC;

ADSORPTION; AMORPHOUS CARBON; ARGON; BORON; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); DEPOSITION; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; DOPING (ADDITIVES); ELECTROCHEMICAL PROPERTIES; ELECTROCHEMISTRY; ELECTROLYSIS; FILM GROWTH; GAS MIXTURES; GRAIN SIZE AND SHAPE; GRAPHITE; LEAKAGE (FLUID); MICROSTRUCTURE; MICROWAVES; MORPHOLOGY; NANOCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CARBON FILMS;

EID: 71749095918     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.09.011     Document Type: Article

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