Preparation of c-axis textured SrTiO3 thin films on Si(1 0 0) substrates by pulsed laser deposition process

Physica B: Condensed Matter

Volumn 405, Issue 1, 2010, Pages 234-238

  Shih, Wen Ching ^a   Yang, Wei Hong ^a  

^a TATUNG UNIVERSITY   (Taiwan)

Author keywords

Pulsed laser deposition; Si; SrTiO3

Indexed keywords

DEPOSITION PARAMETERS; EXCIMERS; FURNACE ANNEALING; OPTIMUM DEPOSITION; OXYGEN PRESSURE; POST TREATMENT; PREFERRED ORIENTATIONS; PULSED LASER; PULSED-LASER DEPOSITION TECHNIQUE; SI; SI(1 0 0); SRTIO; STO THIN FILMS; SUBSTRATE DISTANCE; SUBSTRATE TEMPERATURE; XRD PEAKS;

FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; FULL WIDTH AT HALF MAXIMUM; LASERS; OXIDE MINERALS; OXYGEN; PEROVSKITE; PRESSURE EFFECTS; PULSED LASER DEPOSITION; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTING SILICON COMPOUNDS; SILICON; STRONTIUM ALLOYS; SUBSTRATES;

DEPOSITION;

EID: 71549128369     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2009.08.065     Document Type: Article

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