Growth temperature dependence of SrTiO3 thin films by molecular beam epitaxy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 1 B, 2005, Pages 677-680

  Bhuiyan, Md Nurul Kabir ^a   Kimura, Hiroaki ^a   Tambo, Toyokazu ^a   Tatsuyama, Chiei ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

Atomic force microscopy; Molecular beam epitaxy; Reflection high energy electron diffraction; Si(001) substrates; Sr deposition; SrTiO3 thin films; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; DEPOSITION; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STRONTIUM COMPOUNDS; THERMAL EFFECTS; X RAY DIFFRACTION;

QUARTZ CRYSTAL MICROBALANCE; SI(001) SUBSTRATES; SR DEPOSITION; SRTIO3 THIN FILMS;

THIN FILMS;

EID: 17044401757     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.677     Document Type: Conference Paper

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