The effects of temperature on nanocrystalline diamond films deposited on WC-13 wt.% Co substrate with W-C gradient layer

Applied Surface Science

Volumn 256, Issue 5, 2009, Pages 1322-1328

  Wei, Q P ^a   Yu, Z M ^a   Ma, L ^a   Yin, D F ^a   Ye, J ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Cemented carbide; Diamond film; HFCVD; Interlayer; Nanocrystalline

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CARBIDE TOOLS; CHEMICAL VAPOR DEPOSITION; COBALT; NANOCRYSTALS; NUCLEATION; REACTIVE SPUTTERING; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; TUNGSTEN CARBIDE; X RAY DIFFRACTION;

CEMENTED CARBIDES; EFFECTS OF TEMPERATURE; HFCVD; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; INTERLAYER; MICRO RAMAN SPECTROSCOPY; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINES;

DIAMOND FILMS;

EID: 70849135329     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.06.091     Document Type: Article

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