Microstructural and mechanical investigations of tungsten carbide films deposited by reactive RF sputtering

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6469-6473

  Abdelouahdi, K ^a   Sant, C ^a   Legrand Buscema, C ^a   Aubert, P ^a   Perriere J ^b   Renou, G ^a   Houdy, Ph ^a  

^a Laboratoire d'Etude des Milieux Nanométriques   (France)

^b INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

Mechanical properties; RF sputtering; Structural properties; WC thin films

Indexed keywords

CRYSTAL MICROSTRUCTURE; MECHANICAL PROPERTIES; NANOSTRUCTURED MATERIALS; SINGLE CRYSTALS; SPUTTER DEPOSITION; SUBSTRATES; TUNGSTEN CARBIDE;

REACTIVE SPUTTERING; SINGLE CRYSTAL SUBSTRATES; STRUCTURAL PROPERTIES; TUNGSTEN CARBIDE THIN FILMS;

THIN FILMS;

CRYSTAL MICROSTRUCTURE; MECHANICAL PROPERTIES; NANOSTRUCTURED MATERIALS; SINGLE CRYSTALS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; TUNGSTEN CARBIDE;

EID: 33748183777     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.015     Document Type: Article

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