Thin film growth of reactive sputter deposited tungsten-carbon thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 62-65

  Rack, Philip D ^a  

^a Kate Gleason College of Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; MIXTURES; PLASMAS; REACTION KINETICS; SPUTTER DEPOSITION; SURFACE STRUCTURE; THIN FILMS; TUNGSTEN;

THIN FILM GROWTH; TUNGSTEN-CARBON THIN FILM;

FILM GROWTH;

EID: 0035104188     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1335684     Document Type: Article

References (2)

1. P. K. Srivastava, V. D. Vankar, and K. L. Chopra, J. Vac. Sci. Technol. A 4, 2819 (1986).
2. P. K. Srivastava, V. D. Vankar, and K. L. Chopra, J. Vac. Sci. Technol. A 2. 1261 (1984).