Cutting performance and indentation behaviour of diamond films on Co-cemented tungsten carbide

Surface and Coatings Technology

Volumn 123, Issue 1, 2000, Pages 78-83

  Polini, R ^a   D'Antonio, P ^a   Lo Casto, S ^b   Ruisi, V F ^b   Traversa, E ^a  

^a UNIVERSITY OF ROME TOR VERGATA   (Italy)

^b UNIVERSITY OF PALERMO   (Italy)

Author keywords

Cutting performance; Diamond films; Indentation behaviour

Indexed keywords

ADHESION; ALUMINA; CHEMICAL VAPOR DEPOSITION; CRACK PROPAGATION; CUTTING; DIAMOND FILMS; ETCHING; FILM GROWTH; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS; TUNGSTEN CARBIDE;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); INDENTATION TESTS; MURAKAMI REAGENTS;

COATINGS;

EID: 0033940703     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00471-5     Document Type: Article

References (25)

1. Bull S.J., Matthews A. Diamond Relat. Mater. 1:1992;1049-1064.
2. Leyendecker T., Lemmer O., Jürgens A., Esser S., Ebberink J. Surf. Coat. Technol. 48:1991;253-260.
3. Oles E.J., Inspektor A., Bauer C.E. Diamond Relat. Mater. 5:1996;617-624.
4. Reineck I., Sjöstrand M.E., Karner J., Pedrazzini M. Int. J. Refract. Met. Hard Mater. 14:1996;187-193.
5. Reineck I., Sjöstrand M.E., Karner J., Pedrazzini M. Diamond Relat. Mater. 5:1996;819-824.
6. McCune R.C., Chase R.E., Drawl W.R. Surf. Coat. Technol. 39/40:1989;223-233.
7. Zhu W., McCune R.C., deVries J.E., Tamor M.A., Ng K.Y.S. Diamond Relat. Mater. 3:1994;1270-1276.
8. Narayan J., Vispute R.D., Jagannadham K. J. Adhes. Sci. Technol. 9:1995;753-767.
9. Alam M., Peebles D.E., Tallant D.R. Thin Solid Films. 300:1997;164-170.
10. Oakes J., Pan X.X., Haubner R., Lux B. Surf. Coat. Technol. 47:1991;600-607.
11. Mehlmann A.K., Fayer A., Dirnfeld S., Avigal Y., Porath R., Kochman A. Diamond Relat. Mater. 2:1993;317-322.
12. Deuerler F., van den Berg H., Tabersky R., Freundlieb A., Pies M., Buck V. Diamond Relat. Mater. 5:1996;1478-1489.
13. Cappelli E., Pinzari F., Ascarelli P., Righini G. Diamond Relat. Mater. 5:1996;292-298.
14. Singh R.K., Gilbert D.R., Fitz-Gerald J., Harkness S., Lee D.G. Science. 272:1996;396-398.
15. Zhang B., Zhou L. Thin Solid Films. 307:1997;21-28.
16. Endler I., Leonhardt A., Scheibe H.-J., Born R. Diamond Relat. Mater. 5:1996;299-303.
17. Jindal P.C., Quinto D.T., Wolfe G.J. Thin Solid Films. 154:1987;361-375.
18. Nesládek M., Vandierendonck K., Quaeyhaegens C., Kerhofs M., Stals L.M. Thin Solid Films. 270:1995;184-188.
19. Vandierendonck K., Nesládek M., Kadlec S., Quaeyhaegens C., Van Stappen M., Stals L.M. Surf. Coat. Technol. 98:1998;1060-1065.
20. Taher M.A., Schmidt W.F., Brown W.D., Nasrazadani S., Nasseem H.A., Malshe A.P. Surf. Coat. Technol. 86/87:1996;678-685.
21. Olson J.M., Dawes M.J. J. Mater. Res. 11:1996;1765-1775.
22. Durante S., Rutelli G., Rabezzana F. Surf. Coat. Technol. 94/95:1997;632-640.
23. M.G. Peters and R.H. Cummings, US Patent 5 236 740, 1993.
24. Polini R., Marcheselli G., Traversa E. J. Am. Ceram. Soc. 77:1994;2043-2048.
25. Polini R., Traversa E., Marucci A., Mattei G., Marcheselli G. J. Electrochem. Soc. 144:1997;1371-1375.