Deposition and characterization of nanocrystalline diamond films on Co-cemented tungsten carbide inserts

Diamond and Related Materials

Volumn 16, Issue 3, 2007, Pages 481-485

  Ma, Y P ^a   Sun, F H ^a   Xue, H G ^a   Zhang, Z M ^a   Chen, M ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Bias enhanced HFCVD; Co cemented tungsten carbides; Nanocrystalline diamond films; Surface roughness

Indexed keywords

ACETONE; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COBALT; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; SURFACE ROUGHNESS; TUNGSTEN CARBIDE;

BIAS ENHANCED HFCVD; CO-CEMENTED TUNGSTEN CARBIDES; NANOCRYSTALLINE DIAMOND FILMS; REACTANT GAS;

DIAMOND FILMS;

EID: 33846805788     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.09.020     Document Type: Article

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