Effect of pretreatment, seeding and interlayer on nucleation and growth of HFCVD diamond films on cemented carbide tools

International Journal of Refractory Metals and Hard Materials

Volumn 26, Issue 3, 2008, Pages 220-231

  Sarangi, S K ^a   Chattopadhyay, A ^b   Chattopadhyay, A K ^b  

^a VEER SURENDRA SAI UNIVERSITY OF TECHNOLOGY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

CVD diamond; Interlayer; Nucleation; Surface treatment

Indexed keywords

CARBIDE TOOLS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FILM GROWTH; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT;

CEMENTED CARBIDE TOOLS; NUCLEATION DENSITY;

DIAMOND FILMS;

EID: 38949106890     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijrmhm.2007.05.002     Document Type: Article

References (30)

1. Hintermann H.E., and Chattopadhyay A.K. Low pressure synthesis of diamond coating. Ann CIRP 42 2 (1993) 769-783
2. Lee S.T., Lin Z., and Jiang X. CVD diamond films: nucleation and growth. Mater Sci Eng Rep: Rev J 25 (1999) 123-154
3. Mahalingam P, Liu H, Dandy DS. Chemisorption of hydrocarbon species on transition metals during diamond chemical vapour deposition, Chem Phys Lett 1995 found through internet.
4. Liu H, Dandy DS. Studies on nucleation processes in diamond CVD: an overview of recent development, Department of Chemical Engineering, Colorado State University, Fort Collins, CO 80523, Submitted to 4th International Symposium on Diamond Materials, May 21-26, 1995 found through internet.
5. Singh J., and Veelaikal M. Nucleation of diamond during hot filament chemical vapour deposition. J Appl Phys 73 6 (1993) 2831-2834
6. Sahoo B., and Chattopadhyay A.K. On effectiveness of various surface treatments on adhesion of HF-CVD diamond coating to tungsten carbide inserts. Diam Relat Mater 11 (2002) 1660-1669
7. Ender I., Leonfhardt A., Scheibe H.J., and Born R. Interlayers for diamond deposition on tool materials. Diam Relat Mater 5 (1996) 299-303
8. Wolter S.D., Glass J.T., and Stoner B.R. Bias induced diamond nucleation studies on refractory metal substrates. J Appl Phys 77 10 (1995) 5119-5124
9. Kupp E.R., Drawl W.R., and Spear K.E. Interlayers for diamond-coated cutting tools. Surf Coat Technol 68-69 (1994) 378-383
10. Lin C.R., Kuo C.T., and Chang R.M. Improvement in adhesion of diamond films on cemented WC substrate with Ti-Si interlayers. Diam Relat Mater 7 (1998) 1628-1632
11. Mahalingam P., and Dandy D.S. A quasi-equilibrium model for the prediction of interlayer chemistry during diamond chemical vapor deposition. Thin Solid Films 322 (1998) 108-116
12. Sun C.Q., Fu Y.Q., Yan B.B., Hsieh J.H., Lau S.P., Sun X.W., et al. Improving diamond-metal adhesion with graded TiCN interlayer. J Appl Phys 91 4 (2002) 2051-2054
13. Trindade B., and Vieira M.T. Modification of the structural order of transition metal-carbon systems by the addition of a Group VIII elements. Mater Sci Eng A 352 (2003) 195-201
14. Yehoda J.E., Fuentes R.I., Tsang J.C., Whitehair S.J., Guarnieri C.R., and Cuomo J.J. Enhanced nucleation and growth of diamond on SiC by plasma enhanced chemical vapour deposition using thin metal films. Appl Phys Lett 60 23 (1992) 2865-2867
15. Park S.S., and Lee J.Y. Synthesis of diamond films on titanium substrates by hot-filament chemical vapour deposition. J Appl Phys 69 4 (1991) 2618-2622
16. Kalss W., Haubner R., and Lux B. Synthesis of diamond films on titanium substrates by hot-filament chemical vapour deposition. Diam Relat Mater 6 (1997) 240-246
17. Haubner R., Lindlbauer A., and Lux B. Diamond nucleation and growth on refractory metals using microwave plasma deposition. Int J Met Refract Met Hard Mater 14 (1996) 119-125
18. Joffreau P.O., Haubner R., and Lux B. Low-pressure diamond growth on refractory metals. Int J Met Refract Met Hard Mater 6 (1988) 186-194
19. Louchev O.A., Dussarrat C., and Sato Y. J Appl Phys 86 3 (1999) 1736-1743
20. Weiser P.S., Prawer S., Hoffman A., Paterson P.J.K., and Manory R.R. Chemically vapour deposited diamond films grown on titanium nitride coated and uncoated iron substrates. J Appl Phys 76 4 (1994) 2164-2168
21. Konyashin I.Y., and Guseva M.B. Thin films comparable with WC-Co cemented carbides as underlayers for hard and superhard coatings. Diam Relat Mater 5 (1996) 575-579
22. Deuerler F., Berg H., Tabersky R., Freundlieb A., Pies M., and Buck V. Pretreatment of substrate surface for improved adhesion of diamond films on hard metal cutting tools. Diam Relat Mater 5 (1996) 1478-1489
23. Polini R., Bravi F., Mattei G., Marcheselli G., and Traversa E. Diam Relat Mater 11 (2002) 242-248
24. Mehlmann A.K., Dirnfeld S.F., and Avigal Y. Investigation of low-pressure diamond deposition on cemented carbides. Diam Relat Mater 1 (1992) 600-604
25. Guseva M.B., Babaev V.G., Khvostov V.V., Ludena G.M.L., Bregadze A.Y., Konyashin I.Y., et al. High quality diamond films on WC-Co surfaces. Diam Relat Mater 6 (1997) 89-94
26. Konyashin I.Y., Guseva M.B., Babaev V.G., Khvostov V.V., Lopez G.M., and Alexenko A.E. Diamond films deposited on WC-Co substrate by use of barrier interlayers and nano-grained diamond seeds. Thin Solid Films 300 (1997) 18-24
27. Perry S.S., and Somorjai G.A. Reaction layer formation and fracture at chemically vapour deposited diamond/metal interfaces. J Vac Sci Technol A 12 4 (1994) 1513-1518
28. Terranova M.L., Rossi M., and Vitali G. Structural investigation of the titanium/diamond film interface. J Appl Phys 80 6 (1996) 3552-3560
29. Waite M.M., and Shah S.I. X-ray photoelectron spectroscopy of initial stages of nucleation and growth of diamond thin films during plasma assisted chemical vapour deposition. Appl Phys Lett 60 19 (1992) 2344-2346
30. Fu Y., Yan B., and Loh N.L. Effects of pretreatments and interlayers on the nucleation and growth of diamond coatings on titanium substrates. Surf Coat Technol 130 (2000) 173-185