Custom-specific UV nanoimprint templates and life-time of antisticking layers

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 897-901

  Schmitt, H ^a   Zeidler, M ^b   Rommel, M ^b   Bauer, A J ^b   Ryssel, H ^a,b  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Life time of antisticking layers; Quartz templates; UV curing materials; UV nanoimprint lithography

Indexed keywords

CLEANING; COST EFFECTIVENESS; ETCHING; FUSED SILICA; MASKS; OPTIMIZATION; QUARTZ; SAWING;

ANTISTICKING LAYERS; QUARTZ TEMPLATES; UV CURING MATERIALS;

NANOIMPRINT LITHOGRAPHY;

ETCHING; LITHOGRAPHY; MASKING; SAWING;

EID: 44149104367     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.075     Document Type: Article

References (6)

1. Bender M., Fuchs A., Plachetka U., and Kurz H. Microelectron. Eng. 83 (2006) 827
2. Vratzov B., Fuchs A., Lemme M., Henschel W., and Kurz H. J. Vac. Sci. Technol. B 21 (2003) 2760
3. Schmitt H., Frey L., Ryssel H., Rommel M., and Lehrer C. J. Vac. Sci. Technol. B 25 (2007) 785
4. Colburn M., Johnson S., Stewart M., Damle S., Bailey T., Choi B., Wedlake M., Michaelson T., Sreenivasan S.V., Ekerdt J., and Willson C.G. Proc. SPIE 3676 (1999) 171
5. Irmscher M., Butschke J., Hess G., Letzkus F., Renno M., Sailer H., Schulz H., Schwersenz A., Thompson E., and Vratzow B. Proc. SPIE 5992 (2005) 774
6. Owens D.K., and Wendt R.C. J. Appl. Polym. Sci. 13 (1969) 1741