Atmospheric pressure glow discharge CVD of TiO2 thin films

Proceedings - Electrochemical Society

Volumn PV 2005-09, Issue , 2005, Pages 889-896

  Hodgkinson, John L ^a   Sheel, David W ^a   Yates, Heather M ^a   Davis, Martin J ^a   Pemble, Martyn E ^a,b  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GLASS; GLOW DISCHARGES; PLASMA APPLICATIONS; STOICHIOMETRY; THIN FILMS; TITANIUM DIOXIDE;

BARRIER GLASS; GROWTH TREATMENT;

ATMOSPHERIC PRESSURE;

EID: 31744432810     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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