Resist-free patterned deposition of titanium dioxide thin films by light-induced chemical vapour deposition

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 289-294

  Halary Wagner, E ^a   Bret, T ^a   Brioude, A ^a   Hoffmann, P ^a  

^a EPFL   (Switzerland)

Author keywords

Chemical vapour deposition; Laser; Patterned deposition; Thickness control; TiO2

Indexed keywords

CHEMICAL REACTIONS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; EXCIMER LASERS; OPTICAL COATINGS; OPTICAL DEVICES; OPTICAL SYSTEMS; PHOTOCHEMICAL REACTIONS; THICKNESS CONTROL; TITANIUM DIOXIDE;

PATTERNED DEPOSITION; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 17344389296     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00113-3     Document Type: Conference Paper

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