Atmospheric pressure CVD growth of photocatalytic titanium dioxide thin films on tin oxide

Proceedings - Electrochemical Society

Volumn PV 2005-09, Issue , 2005, Pages 783-790

  Yates, H M ^a   Nolan, M G ^a   Sheel, D W ^a   Pemble, M E ^b  

^a UNIVERSITY OF SALFORD   (United Kingdom)

^b UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; RAMAN SPECTROSCOPY; TIN COMPOUNDS; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

MORPHOLOGICAL EFFECTS; PHOTOCATALYTIC ACTIVITY;

THIN FILMS;

EID: 31744442638     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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