Adhesion of Ti and TiC coatings on PMMA subject to plasma treatment: Effect of intermediate layers of Al2O3 and TiO2 deposited by atomic layer deposition

Plasma Processes and Polymers

Volumn 6, Issue 10, 2009, Pages 631-641

  Kääriäinen, Tommi O ^a   Cameron, David C ^a   Tanttari, Mari ^b  

^a LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

^b Sandvik Mining and Construction Oy   (Finland)

Author keywords

Adhesion; Atomic layer deposition; Oxides; Physical vapor deposition; PMMA

Indexed keywords

ADHESION LAYER; ADHESION STRENGTHS; CARBIDE LAYERS; DECORATIVE FINISHES; DEPOSITED LAYER; DUPLEX PROCESS; FAILURE MECHANISM; INTERMEDIATE LAYERS; ION DAMAGE; LOW TEMPERATURES; METAL COMPOUNDS; METAL PRECURSOR; NANO-METER-SCALE; PLASMA DAMAGE; PLASMA TREATMENT; POLYMER STRUCTURE; POOR ADHESION; PULL-OFF; PULSED DC; SCRATCH RESISTANT; SPUTTERING PROCESS; SUBSTRATE MATERIAL; TIO; ULTRA-VIOLET;

ADHESION; ALUMINUM; ATOMS; DEPOSITION; MAGNETRONS; OZONE; PHYSICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; POLYMER FILMS; TITANIUM CARBIDE;

ATOMIC LAYER DEPOSITION;

EID: 70450218143     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900038     Document Type: Article

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